Multiscale modelling and control of thin film deposition processes encompass advanced simulation techniques that integrate phenomena occurring over disparate spatial and temporal scales. At the ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...

There are many ways to deposit a nanosized film, in what is termed ‘bottom-up’ deposition methods. Nanosized films can also be produced by top-down approaches—such as lithography or etching—where ...

A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Thin film technology focuses on the deposition and analysis of functional material layers on a substrate. These layers are essential building blocks in modern devices, like the microchips found in ...

Following the publication of the revised Foreign Exchange and Foreign Trade Act in March 2023, the Japanese government on May 23 announced to impose export restrictions on 23 items of semiconductor ...

AUSTIN, Texas--(BUSINESS WIRE)--Sept. 11, 2006--Building on more than two years of collaboration with the National Renewable Energy Laboratory (NREL), HelioVolt today announced it will extend the ...

The laser wavelength, pulse duration, and fluence (energy density) significantly influence the ablation process and the resulting plasma plume. Shorter wavelengths and higher fluences generally lead ...

A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the Graduate School of Semiconductor Materials and Devices Engineering at UNIST, has made a ...